Catálogo Bibliográfico
LDR | ·····pam##22·····#a#4500 |
001 | 012818 |
005 | 20081217145257.0 |
008 | 901218s1992####njua###f#b####001#0#eng## |
245 | 10 | $a Handbook of sputter deposition technology : $b principles, technology, and applications / $c by Kiyotaka Wasa and Shigeru Hayakawa. |
260 | ## | $a Park Ridge, N.J., U.S.A. : $b Noyes Publications, $c c1992. |
300 | ## | $a xii, 304 p. : $b il. ; $c 24 cm. |
490 | 1# | $a Materials science and process technology series |
504 | ## | $a Incluye referencias bibliográficas e índice. |
020 | ## | $a 0815512805 |
100 | 1# | $a Wasa, Kiyotaka. |
700 | 1# | $a Hayakawa, Shigeru, $d 1925- |
080 | ## | $a 539.23 |
650 | #0 | $a Cathode sputtering (Plating process) |
650 | #0 | $a Thin films. |
040 | ## | $a DLC $c DLC $d DLC $b spa $d arbccab |
856 | 42 | $3 Reseña $u http://www.loc.gov/catdir/description/wap041/90027820.html |