Catálogo Bibliográfico
LDR | ·····cam##22·····#a#4500 |
001 | 008968 |
005 | 20060731133522.0 |
008 | 950710s1995####ne#a#####b####101#0#eng## |
245 | 10 | $a Ion implantation technology-94 : $b proceedings of the Tenth International Conference on Ion Implantation Technology, Catania, Italy, June 13-17, 1994 / $c editors, Salvatore Coffa ... [et al.]. |
260 | ## | $a Amsterdam ; $a New York : $b North-Holland, $c 1995. |
300 | ## | $a xvii, 1012 p. : $b il. ; $c 27 cm. |
020 | ## | $a 0444821945 (acid-free paper) |
111 | 2# | $a International Conference on Ion Implantation Technology $n (10th : $d 1994 : $c Catania, Italy) |
700 | 1# | $a Coffa, S. |
080 | ## | $a 621.382:061.3 |
082 | 00 | $a 621.3815/2 $2 20 |
650 | #0 | $a Semiconductors $v Congresses. |
650 | #0 | $a Ion implantation $v Congresses. |
650 | #0 | $a Semiconductor doping $v Congresses. |
010 | ## | $a ###95175281# |
050 | 00 | $a TK7871.85 $b .I57623 1994 |
049 | ## | $a AR5A |
504 | ## | $a Incluye referencias bibliográficas. |
040 | ## | $a DLC $c DLC $d OCL $d BAKER $b spa $d arbccab |
500 | ## | $a "Part 1 (pp. 1-440) reprinted from: Nuclear instruments and methods in physics research, Section B: Beam interactions with materials and atoms, vol. B96, 1-2"--t.p. verso. |
500 | ## | $a Incluye índice. |